Профиль » Публикация
Опубликовано
1998-00-00
ОрганизацияJoint Research Center for Atom Technology (JRCAT), 1-1-4 Higashi, Tsukuba, Ibaraki 305, Japan *Angstrom Technology Partnership (ATP) $National Institute for Advanced Interdisciplinary Research (NAIR) -Department of Physical Chemistry, Center for M
ЖурналЖурнал "Физика и Техника Полупроводников"
On the transport properties of microcrystalline silicon at low temperatures
Zhou J.-H., Baranovskii S.D., Yamasaki S., Ikuta K., Kondo M., Matsuda A., Tanaka K. On the transport properties of microcrystalline silicon at low temperatures // ФТП, 1998, том 32, выпуск 8, Стр. 905
Аннотация
The dark and photoconductivity along with pulsed electron spin resonance have been measured over a wide temperature range with a high crystallinity hydrogenated microcrystalline silicon (mu c-Si : H) sample. The transport mechanism in mu c-Si : H is discussed based on these measurements. Striking similarities in the temperature dependences of the dark and photoconductivity between mu c-Si : H and some well studied materials, such as hydrogenated amorphous silicon, suggest that at low temperatures hopping of carriers between localized states dominates the transport properties of mu c-Si : H.
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